Company name: FSI International
Products & Services made or distributed: FSI International, ANTARES CX Advanced, cleaning systems, batch processing techniques, batch spray, BEOL strip, centrifugal spray, critical cleaning, critical etching, Cryogenic, defect removal, DIO3 Ozone Generator, EXCALIBUR 2000 Vapor HF Etching System, FEOL strip, MAGELLAN Immersion Cleaning System, MERCURY Spray Processing Systems, new material, next-generation design, ORION Dry Cleaning Module, nanostructure formation, photo-chemical, photolithography, photosensitive materials, POLARIS 2500 Microlithography Cluster, POLARIS 3500 Microlithography Cluster, resist processing, semiconductor equipment, silicon wafers, single wafer spray, thin film head, wafer cleaning, wafer processing, YieldUP Rinse Dry Module, ZETA Spray Processing Systems, vapor HF processor, HF etcher, particle removal
Company Website: http://www.fsi-intl.com
Brief description: FSI International enables microelectronics manufacturers for companies like Texas Instruments, Intel, Sony, Samsung and Philip.
Extended description: FSI International manufacturer of semiconductors. They are specialized in critical wafer cleaning processes used to build microscopic circuit features onto silicon wafers. They provide FEOL critical clean, FEOL photoresist strip and post ash clean, oxide etch, nitride etch, wafer reclaim
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